Authors: Rothschild, A Komem, Y Cosandey, F

Citation: A. Rothschild et al., Low temperature reoxidation mechanism in nanocrystalline TiO2-delta thin films, J ELCHEM SO, 148(8), 2001, pp. H85-H89

Authors: Rothschild, A Edelman, F Komem, Y Cosandey, F

Citation: A. Rothschild et al., Sensing behavior of TiO2 thin films exposed to air at low temperatures, SENS ACTU-B, 67(3), 2000, pp. 282-289

Authors: Edelman, F Raz, T Komem, Y Zaumseil, P Osten, HJ Capitan, M

Citation: F. Edelman et al., Crystallization of amorphous Si0.5Ge0.5 films studied by means of in-situ X-ray diffraction and in-situ transmission electron microscopy, PHIL MAG A, 79(11), 1999, pp. 2617-2628

Authors: Edelman, F Raz, T Komem, Y Stolzer, M Werner, P Zaumseil, P Osten, HJ Griesche, J Capitan, M

Citation: F. Edelman et al., Stability and transport properties of microcrystalline Si1-xGex films, THIN SOL FI, 337(1-2), 1999, pp. 152-157