Authors: Ito, T Imaizumi, M Yamaguchi, K Okitsu, K Konomi, I Yamaguchi, M Hara, T Ban, M Tohkai, M Kawamura, K

Citation: T. Ito et al., Growth rate and crystallinity of nanocrystalline silicon film grown by electron beam excited plasma chemical vapor deposition, JPN J A P 1, 39(10), 2000, pp. 6035-6036

Authors: Awaji, N Ozaki, S Nishino, J Noguchi, S Yamamoto, T Syoji, T Yamagami, M Kobayashi, A Hirai, Y Shibata, M Yamaguchi, K Liu, KY Kawado, S Takahashi, M Yasuami, S Konomi, I Kimura, S Hirai, Y Hasegawa, M Komiya, S Hirose, T Okajima, T

Citation: N. Awaji et al., Wavelength-dispersive total reflection X-ray fluorescence with high-brilliance undulator radiation at SPring-8, JPN J A P 2, 39(12A), 2000, pp. L1252-L1255

Authors: Konomi, I Hyodo, S Motohiro, T

Citation: I. Konomi et al., Simulation of MEIS spectra for quantitative understanding of average size,composition, and size distribution of Pt-Rh alloy nanoparticles, J CATALYSIS, 192(1), 2000, pp. 11-17

Authors: Imaizumi, M Yamaguchi, K Okitsu, K Yamaguchi, M Hara, T Ito, T Konomi, I Jones, KM Al-Jassim, MM

Citation: M. Imaizumi et al., Effects of hydrogen on the growth of nanocrystalline silicon films by electron-beam excited plasma chemical vapor deposition, J APPL PHYS, 88(11), 2000, pp. 6848-6855