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Authors: Chang, JP Krautter, HW Zhu, W Opila, RL Pai, CS

Citation: Jp. Chang et al., Integration of fluorinated amorphous carbon as low-dielectric constant insulator: Effects of heating and deposition of tantalum nitride, J VAC SCI A, 17(5), 1999, pp. 2969-2974

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Citation: Bf. Levine et al., Ultralow-dark-current wafer-bonded Si/InGaAs photodetectors, APPL PHYS L, 75(14), 1999, pp. 2141-2143