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Results: 1-3 |
Results: 3
SUBSTRATE BIAS EFFECTS IN HIGH-ASPECT-RATIO SIO2 CONTACT ETCHING USING AN INDUCTIVELY-COUPLED PLASMA REACTOR
Authors: WESTERHEIM AC LABUN AH DUBASH JH ARNOLD JC SAWIN HH YUWANG V
Citation: Ac. Westerheim et al., SUBSTRATE BIAS EFFECTS IN HIGH-ASPECT-RATIO SIO2 CONTACT ETCHING USING AN INDUCTIVELY-COUPLED PLASMA REACTOR, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 853-858
PROFILE SIMULATION OF ELECTRON-CYCLOTRON-RESONANCE PLANARIZATION OF AN INTERLEVEL DIELECTRIC
Authors: LABUN AH
Citation: Ah. Labun, PROFILE SIMULATION OF ELECTRON-CYCLOTRON-RESONANCE PLANARIZATION OF AN INTERLEVEL DIELECTRIC, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3138-3144
OPTIMIZATION OF PHOTOINITIATED IMPULSE-ENHANCED ELECTRICALLY EXCITED CO2-LASER DISCHARGES BY ATTACHMENT CONTROL
Authors: LABUN AH SEGUIN HJJ CAPJACK CE
Citation: Ah. Labun et al., OPTIMIZATION OF PHOTOINITIATED IMPULSE-ENHANCED ELECTRICALLY EXCITED CO2-LASER DISCHARGES BY ATTACHMENT CONTROL, Review of scientific instruments, 64(6), 1993, pp. 1445-1450
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