Authors:
PRIVITERA V
COFFA S
PRIOLO F
LARSEN KK
LIBERTINO S
CARNERA A
Citation: V. Privitera et al., ROOM-TEMPERATURE MIGRATION OF ION-BEAM INJECTED POINT-DEFECTS IN CRYSTALLINE SILICON, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 120(1-4), 1996, pp. 9-13
Authors:
COWERN NEB
HUIZING HGA
STOLK PA
VISSER CCG
DEKRUIF RCM
LARSEN KK
PRIVITERA V
NANVER LK
CRANS W
Citation: Neb. Cowern et al., TIME SCALES OF TRANSIENT ENHANCED DIFFUSION - FREE AND CLUSTERED INTERSTITIALS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 120(1-4), 1996, pp. 14-18
Authors:
LARSEN KK
PRIVITERA V
COFFA S
PRIOLO F
SPINELLA C
SAGGIO M
CAMPISANO SU
Citation: Kk. Larsen et al., THE DAMAGE RECOVERY AND ELECTRICAL ACTIVATION OF SHALLOW BORON IMPLANTS IN SILICON - THE EFFECTS OF HIGH-ENERGY IMPLANTS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 112(1-4), 1996, pp. 139-143
Citation: E. Roca et al., INFLUENCE OF GRAIN-BOUNDARY SCATTERING IN THE INFRARED RESPONSE OF SILICIDE SCHOTTKY-BARRIER DIODES, Journal of applied physics, 79(8), 1996, pp. 4426-4430
Authors:
LOMBARDO S
LARSEN KK
RAINERI V
LAVIA F
CAMPISANO SU
LAGOMARSINO S
KAZIMIROV A
Citation: S. Lombardo et al., CHARACTERIZATION OF C COIMPLANTED GEXSI1-X EPITAXIAL LAYERS FORMED BYHIGH-DOSE GE ION-IMPLANTATION IN (100)SI, Journal of applied physics, 79(7), 1996, pp. 3456-3463
Authors:
LOMBARDO S
CACCIATO A
LARSEN KK
RAINERI V
LAVIA F
PRIVITERA V
CAMPISANO SU
Citation: S. Lombardo et al., HIGH-TEMPERATURE ANNEALING EFFECTS ON THE ELECTRICAL CHARACTERISTICS OF C IMPLANTED SI, Journal of applied physics, 79(7), 1996, pp. 3464-3469
Authors:
KORENIVSKI V
RAO KV
KELLY DM
SCHULLER IK
LARSEN KK
BOTTIGER J
Citation: V. Korenivski et al., MAGNETOTRANSPORT AND EXCHANGE COUPLING IN FE CR MULTILAYERS - EFFECTSOF ANNEALING AND ION IRRADIATION/, Journal of magnetism and magnetic materials, 144, 1995, pp. 549-550
Authors:
LARSEN KK
TAVARES J
BENDER H
DONATON RA
LAUWERS A
MAEX K
Citation: Kk. Larsen et al., GROWTH OF EPITAXIAL BETA-FESI2 ON (100)SILICON USING FE-TI-SI DIFFUSION COUPLES, Journal of applied physics, 78(1), 1995, pp. 599-601
Authors:
LARSEN KK
LAVIA F
LOMBARDO S
RAINERI V
CAMPISANO SU
Citation: Kk. Larsen et al., SECONDARY DEFECT ANNIHILATION IN ION-BEAM PROCESSED SIXGE1-X LAYERS USING TITANIUM SILICIDE, Applied physics letters, 67(20), 1995, pp. 2931-2933
Citation: E. Roca et al., INCREASE IN THE INFRARED RESPONSE OF SILICIDE SCHOTTKY-BARRIER DIODESBY GRAIN-BOUNDARY SCATTERING, Applied physics letters, 67(10), 1995, pp. 1372-1374
Authors:
BOTTIGER J
CHECHENIN NG
GREER AL
KARPE N
KROG JP
LARSEN KK
Citation: J. Bottiger et al., LOWERED INTERDIFFUSIVITY IN THIN AMORPHOUS NI-ZR FILMS WITH LARGE COMPOSITION GRADIENTS, Philosophical magazine. B. Physics of condensed matter. Structural, electronic, optical and magnetic properties, 69(6), 1994, pp. 1083-1091
Authors:
LARSEN KK
SKOVMAND S
KARPE N
BOTTIGER J
BORMANN R
Citation: Kk. Larsen et al., ON THE PHASE-FORMATION DURING ION-BEAM MIXING OF AL-TI, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 80-1, 1993, pp. 390-393