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Results:
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Results: 4
ENHANCED DEPOSITION RATES IN PLASMA SPUTTER-DEPOSITION
Authors:
THOMANN AL CHARLES C BRAULT P LAURE C BOSWELL R
Citation:
Al. Thomann et al., ENHANCED DEPOSITION RATES IN PLASMA SPUTTER-DEPOSITION, Plasma sources science & technology, 7(3), 1998, pp. 245-251
PLASMA-ASSISTED DEPOSITION OF PD THIN-FILMS
Authors:
THOMANN AL BRAULT P LAURE C ROUSSEAU B ESTRADESZWARCKOPF H ANDREAZZAVIGNOLLE C ANDREAZZA P NAUDON A
Citation:
Al. Thomann et al., PLASMA-ASSISTED DEPOSITION OF PD THIN-FILMS, Surface & coatings technology, 98(1-3), 1998, pp. 1228-1232
PLASMA-ASSISTED EVAPORATION OF PALLADIUM
Authors:
LAURE C BRAULT P THOMMAN AL BOSWELL R ROUSSEAU B ESTRADESZWARCKOPF H
Citation:
C. Laure et al., PLASMA-ASSISTED EVAPORATION OF PALLADIUM, Plasma sources science & technology, 5(3), 1996, pp. 510-513
IN-SITU RAMAN-SPECTROSCOPY OF SILICON SURFACES DURING SF6 PLASMA-ETCHING
Authors:
BRAULT P MATHIAS J LAURE C RANSON P TEXIER O
Citation:
P. Brault et al., IN-SITU RAMAN-SPECTROSCOPY OF SILICON SURFACES DURING SF6 PLASMA-ETCHING, Journal of physics. Condensed matter, 6(1), 1994, pp. 1-6
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