Authors: THOMANN AL CHARLES C BRAULT P LAURE C BOSWELL R

Citation: Al. Thomann et al., ENHANCED DEPOSITION RATES IN PLASMA SPUTTER-DEPOSITION, Plasma sources science & technology, 7(3), 1998, pp. 245-251

Authors: THOMANN AL BRAULT P LAURE C ROUSSEAU B ESTRADESZWARCKOPF H ANDREAZZAVIGNOLLE C ANDREAZZA P NAUDON A

Citation: Al. Thomann et al., PLASMA-ASSISTED DEPOSITION OF PD THIN-FILMS, Surface & coatings technology, 98(1-3), 1998, pp. 1228-1232

Authors: LAURE C BRAULT P THOMMAN AL BOSWELL R ROUSSEAU B ESTRADESZWARCKOPF H

Citation: C. Laure et al., PLASMA-ASSISTED EVAPORATION OF PALLADIUM, Plasma sources science & technology, 5(3), 1996, pp. 510-513

Authors: BRAULT P MATHIAS J LAURE C RANSON P TEXIER O

Citation: P. Brault et al., IN-SITU RAMAN-SPECTROSCOPY OF SILICON SURFACES DURING SF6 PLASMA-ETCHING, Journal of physics. Condensed matter, 6(1), 1994, pp. 1-6