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Authors: ROMERO V LAYEILLON L OSEGUERA J
Citation: V. Romero et al., MODELING OF CONCENTRATION DISTRIBUTIONS OF ACTIVE SPECIES DURING PLASMA NITRIDING, Surface & coatings technology, 87-8(1-3), 1996, pp. 338-344

Authors: DOLLET A LAYEILLON L COUDERC JP DESPAX B
Citation: A. Dollet et al., ANALYSIS AND MODELING OF A PULSED-PLASMA REACTOR FOR SILICON-NITRIDE DEPOSITION - REACTOR OPTIMIZATION, Plasma sources science & technology, 4(3), 1995, pp. 459-473

Authors: LAYEILLON L DOLLET A DESPAX B
Citation: L. Layeillon et al., PLASMA-ENHANCED DEPOSITION OF A-SI-H - COMPARISON OF 2 REACTOR ARRANGEMENTS, Chemical engineering journal and the biochemical engineering journal, 58(1), 1995, pp. 1-5
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