Authors: BRUENGER WH BUSCHBECK H CEKAN E EDER S FEDYNYSHYN TH HERTLEIN WG HUDEK P KOSTIC I LOESCHNER H RANGELOW IW TORKLER M

Citation: Wh. Bruenger et al., DUV RESIST UV-II HS APPLIED TO HIGH-RESOLUTION ELECTRON-BEAM LITHOGRAPHY AND TO MASKED ION-BEAM PROXIMITY AND REDUCTION PRINTING, Microelectronic engineering, 42, 1998, pp. 237-240