Authors:
BRUENGER WH
BUSCHBECK H
CEKAN E
EDER S
FEDYNYSHYN TH
HERTLEIN WG
HUDEK P
KOSTIC I
LOESCHNER H
RANGELOW IW
TORKLER M
Citation: Wh. Bruenger et al., DUV RESIST UV-II HS APPLIED TO HIGH-RESOLUTION ELECTRON-BEAM LITHOGRAPHY AND TO MASKED ION-BEAM PROXIMITY AND REDUCTION PRINTING, Microelectronic engineering, 42, 1998, pp. 237-240