Authors:
NGUYEN TK
LANDSBERGER LM
JEAN C
LOGIUDICE V
Citation: Tk. Nguyen et al., EFFECTS OF FLUORINE IMPLANTS ON INDUCED CHARGE COMPONENTS IN GATE-OXIDES UNDER CONSTANT-CURRENT FOWLER-NORDHEIM STRESS, I.E.E.E. transactions on electron devices, 44(9), 1997, pp. 1432-1440