AAAAAA

   
Results: 1-4 |
Results: 4

Authors: RIETMAN EA FRIEDMAN DJ LORY ER
Citation: Ea. Rietman et al., PREPRODUCTION RESULTS DEMONSTRATING MULTIPLE-SYSTEM MODELS FOR YIELD ANALYSIS, IEEE transactions on semiconductor manufacturing, 10(4), 1997, pp. 469-481

Authors: RIETMAN EA PATEL SH LORY ER
Citation: Ea. Rietman et al., MODELING AND CONTROL OF A SEMICONDUCTOR MANUFACTURING PROCESS WITH ANAUTOMATA NETWORK - AN EXAMPLE IN PLASMA ETCH PROCESSING, Computers & operations research, 23(6), 1996, pp. 573-585

Authors: RIETMAN EA FRYE RC LORY ER HARRY TR
Citation: Ea. Rietman et al., ACTIVE NEUTRAL NETWORK CONTROL OF WAFER ATTRIBUTES IN A PLASMA ETCH PROCESS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(4), 1993, pp. 1314-1316

Authors: RIETMAN EA LORY ER
Citation: Ea. Rietman et Er. Lory, USE OF NEURAL NETWORKS IN MODELING SEMICONDUCTOR MANUFACTURING PROCESSES - AN EXAMPLE FOR PLASMA ETCH MODELING, IEEE transactions on semiconductor manufacturing, 6(4), 1993, pp. 343-347
Risultati: 1-4 |