Authors: Lampin, E Senez, V Claverie, A

Citation: E. Lampin et al., Modelisation of extended defects to simulate the transient enhanced diffusion of boron, MAT SCI E B, 71, 2000, pp. 155-159

Authors: Senez, V Herbaux, J Hoffmann, T Lampin, E

Citation: V. Senez et al., 3-dimensional process simulation of thermal annealing of low dose implanted dopants in silicon, IEICE TR EL, E83C(8), 2000, pp. 1267-1274

Authors: Lampin, E Senez, V

Citation: E. Lampin et V. Senez, Modeling of the kinetics of dislocation loops, NUCL INST B, 147(1-4), 1999, pp. 13-17

Authors: Lampin, E Senez, V Claverie, A

Citation: E. Lampin et al., Modeling of the transient enhanced diffusion of boron implanted into preamorphized silicon, J APPL PHYS, 85(12), 1999, pp. 8137-8144