Authors:
Lander, RJP
Ponomarev, YV
van Berkum, JGM
de Boer, WB
Citation: Rjp. Lander et al., High hole mobilities in fully-strained Si1-xGex layers (0.3 < x < 0.4) andtheir significance for SiGe pMOSFET performance, IEEE DEVICE, 48(8), 2001, pp. 1826-1832
Authors:
Lander, RJP
Ponomarev, YV
van Berkum, JGM
de Boer, WB
Loo, R
Caymax, M
Citation: Rjp. Lander et al., Drift mobilities and Hall scattering factors of holes in ultrathin Si1-xGex layers (0.3 < x < 0.4) grown on Si, J APPL PHYS, 88(4), 2000, pp. 2016-2023
Citation: Bmm. Mcgregor et al., Temperature-dependent Hall scattering factor and drift mobility in remotely doped Si : B/SiGe/Si heterostructures, APPL PHYS L, 74(9), 1999, pp. 1245-1247