Citation: Kks. Lau et Kk. Gleason, Thermal annealing of fluorocarbon films grown by hot filament chemical vapor deposition, J PHYS CH B, 105(12), 2001, pp. 2303-2307
Authors:
Lau, KKS
Lewis, HGP
Limb, SJ
Kwan, MC
Gleason, KK
Citation: Kks. Lau et al., Hot-wire chemical vapor deposition (HWCVD) of fluorocarbon and organosilicon thin films, THIN SOL FI, 395(1-2), 2001, pp. 288-291
Citation: Kks. Lau et al., Structure and morphology of fluorocarbon films grown by hot filament chemical vapor deposition, CHEM MATER, 12(10), 2000, pp. 3032-3037
Citation: Kks. Lau et al., Variable angle spectroscopic ellipsometry of fluorocarbon films from hot filament chemical vapor deposition, J VAC SCI A, 18(5), 2000, pp. 2404-2411
Citation: Kks. Lau et Kk. Gleason, Pulsed plasma enhanced and hot filament chemical vapor deposition of fluorocarbon films, J FLUORINE, 104(1), 2000, pp. 119-126
Citation: Kks. Lau et Kk. Gleason, Solid-state nuclear magnetic resonance spectroscopy of low dielectric constant films from pulsed hydrofluorocarbon plasmas, J ELCHEM SO, 146(7), 1999, pp. 2652-2658