Authors:
Vyvoda, MA
Li, M
Graves, DB
Lee, H
Malyshev, MV
Klemens, FP
Lee, JTC
Donnelly, VM
Citation: Ma. Vyvoda et al., Role of sidewall scattering in feature profile evolution during Cl-2 and HBr plasma etching of silicon, J VAC SCI B, 18(2), 2000, pp. 820-833
Authors:
Lane, JM
Bogart, KHA
Klemens, FP
Lee, JTC
Citation: Jm. Lane et al., The role of feedgas chemistry, mask material, and processing parameters inprofile evolution during plasma etching of Si(100), J VAC SCI A, 18(5), 2000, pp. 2067-2079