Authors: Butcher, KSA Tansley, TL Prince, K Leech, PW

Citation: Ksa. Butcher et al., Predeposition ultraviolet treatment for adhesion improvement of thin filmson mercury cadmium telluride, J VAC SCI A, 19(1), 2001, pp. 90-96

Authors: Leech, PW Reeves, GK Holland, A

Citation: Pw. Leech et al., Reactive ion etching of diamond in CF4, O-2, O-2 and Ar-based mixtures, J MATER SCI, 36(14), 2001, pp. 3453-3459

Authors: Leech, PW Ridgway, MC

Citation: Pw. Leech et Mc. Ridgway, Enhancement of the etch rate of LiNbO3 by prior bombardment with MeV O2+ ions, J VAC SCI A, 17(6), 1999, pp. 3358-3361

Authors: Leech, PW Ridgway, MC

Citation: Pw. Leech et Mc. Ridgway, Effect of MeV O2+ implantation on the reactive ion etch rate of LiTaO3, NUCL INST B, 159(3), 1999, pp. 187-190

Authors: Leech, PW

Citation: Pw. Leech, Reactive ion etching of quartz and silica-based glasses in CF4/CHF3 plasmas, VACUUM, 55(3-4), 1999, pp. 191-196