Citation: K. Oyoshi et al., Study of structure and optical properties of beta-FeSi2 precipitates formed by ion-implantation of Fe+ in Si(100) and effects of co-implantation of Fe+ and Si+ in amorphous SiO2, THIN SOL FI, 381(2), 2001, pp. 194-201
Citation: K. Oyoshi et al., Formation of beta-FeSi2 precipitates at the SiO2/Si interface by Fe+ ion implantation and their structural and optical properties, THIN SOL FI, 381(2), 2001, pp. 202-208
Authors:
Lenssen, D
Carius, R
Mantl, S
Birdwell, AG
Citation: D. Lenssen et al., Electrical and optical characterization of semiconducting Ru2Si3 films andsingle crystals, J APPL PHYS, 90(7), 2001, pp. 3347-3352