Authors: van de Sanden, MCM van Hest, MFAM de Graaf, A Smets, AHM Letourneur, KGY Boogaarts, MGH Schram, DC

Citation: Mcm. Van De Sanden et al., Plasma chemistry of an expanding Ar/C2H2 plasma used for fast deposition of a-C : H, DIAM RELAT, 8(2-5), 1999, pp. 677-681

Authors: Engeln, R Letourneur, KGY Boogaarts, MGH van de Sanden, MCM Schram, DC

Citation: R. Engeln et al., Detection of CH in an expanding argon/acetylene plasma using cavity ring down absorption spectroscopy, CHEM P LETT, 310(5-6), 1999, pp. 405-410

Authors: de Graaf, A van Hest, MFAM van de Sanden, MCM Letourneur, KGY Schram, DC

Citation: A. De Graaf et al., Argon ion-induced dissociation of acetylene in an expanding Ar/C2H2 plasma, APPL PHYS L, 74(20), 1999, pp. 2927-2929