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Results: 1-9 |
Results: 9
Periodically poled BaMgF4 for ultraviolet frequency generation
Authors: Buchter, SC Fan, TY Liberman, V Zayhowski, JJ Rothschild, M Mason, EJ Cassanho, A Jenssen, HP Burnett, JH
Citation: Sc. Buchter et al., Periodically poled BaMgF4 for ultraviolet frequency generation, OPTICS LETT, 26(21), 2001, pp. 1693-1695
Review of technology for 157-nm lithography
Authors: Bates, AK Rothschild, M Bloomstein, TM Fedynyshyn, TH Kunz, RR Liberman, V Switkes, M
Citation: Ak. Bates et al., Review of technology for 157-nm lithography, IBM J RES, 45(5), 2001, pp. 605-614
Arrays of field emission cathode structures with sub-300 nm gates
Authors: Bernhardt, AF Contolini, RJ Jankowski, AF Liberman, V Morse, JD Musket, RG Barton, R Macaulay, J Spindt, C
Citation: Af. Bernhardt et al., Arrays of field emission cathode structures with sub-300 nm gates, J VAC SCI B, 18(3), 2000, pp. 1212-1215
Experimentation and modeling of organic photocontamination on lithographicoptics
Authors: Kunz, RR Liberman, V Downs, DK
Citation: Rr. Kunz et al., Experimentation and modeling of organic photocontamination on lithographicoptics, J VAC SCI B, 18(3), 2000, pp. 1306-1313
157 nm: Deepest deep-ultraviolet yet
Authors: Rothschild, M Bloomstein, TM Curtin, JE Downs, DK Fedynyshyn, TH Hardy, DE Kunz, RR Liberman, V Sedlacek, JHC Uttaro, RS Bates, AK Van Peski, C
Citation: M. Rothschild et al., 157 nm: Deepest deep-ultraviolet yet, J VAC SCI B, 17(6), 1999, pp. 3262-3266
Materials issues for optical components and photomasks in 157 nm lithography
Authors: Liberman, V Bloomstein, TM Rothschild, M Sedlacek, JHC Uttaro, RS Bates, AK Van Peski, C Orvek, K
Citation: V. Liberman et al., Materials issues for optical components and photomasks in 157 nm lithography, J VAC SCI B, 17(6), 1999, pp. 3273-3279
Excimer-laser-induced degradation of fused silica and calcium fluoride for193-nm lithographic applications
Authors: Liberman, V Rothschild, M Sedlacek, JHC Uttaro, RS Grenville, A Bates, AK Van Peski, C
Citation: V. Liberman et al., Excimer-laser-induced degradation of fused silica and calcium fluoride for193-nm lithographic applications, OPTICS LETT, 24(1), 1999, pp. 58-60
Excimer-laser-induced densification of fused silica: laser-fluence and material-grade effects on the scaling law
Authors: Liberman, V Rothschild, M Sedlacek, JHC Uttaro, RS Grenville, A
Citation: V. Liberman et al., Excimer-laser-induced densification of fused silica: laser-fluence and material-grade effects on the scaling law, J NON-CRYST, 244(2-3), 1999, pp. 159-171
Spatial pattern of microchannel formation in fused silica irradiated by nanosecond ultraviolet pulses
Authors: Wright, EM Mansuripur, M Liberman, V Bates, K
Citation: Em. Wright et al., Spatial pattern of microchannel formation in fused silica irradiated by nanosecond ultraviolet pulses, APPL OPTICS, 38(27), 1999, pp. 5785-5788
Risultati: 1-9 |