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Results:
1-8
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Results: 8
Authors:
Clark, WW
Beatrice, JM
Lichtenberger, AW
Citation: Ww. Clark et al., Effects of geometry and hardware on the stress of Nb thin films, IEEE APPL S, 11(1), 2001, pp. 3824-3827
Authors:
Bass, RB
Clark, WW
Zhang, JZ
Lichtenberger, AW
Citation: Rb. Bass et al., Use of a focused ion beam for characterizing SIS circuits, IEEE APPL S, 11(1), 2001, pp. 92-94
Authors:
Bishop, WL
Summers, DM
Lichtenberger, AW
Citation: Wl. Bishop et al., Precision techniques for whole wafer dicing and thinning of superconducting mixer circuits, IEEE APPL S, 11(1), 2001, pp. 171-174
Authors:
Bass, RB
Zhang, JZ
Lichtenberger, AW
Citation: Rb. Bass et al., Machine-aligned fabrication of submicron SIS tunnel junctions using a focused ion beam, IEEE APPL S, 9(2), 1999, pp. 3240-3243
Authors:
Huang, HH
Zhang, JZ
Lichtenberger, AW
Miller, RE
Citation: Hh. Huang et al., Unexpected geometrical anodization effect in the fabrication of Nb/Al-oxide/Nb junctions, IEEE APPL S, 9(2), 1999, pp. 3244-3246
Authors:
Amos, RS
Lichtenberger, AW
Tong, CE
Blundell, R
Pan, SK
Kerr, AR
Citation: Rs. Amos et al., Nb/Al-AlOx/Nb edge junctions for distributed mixers, IEEE APPL S, 9(2), 1999, pp. 3878-3881
Authors:
Datesman, AM
Zhang, JZ
Lichtenberger, AW
Citation: Am. Datesman et al., A new fabrication technique for ultra-small diffusion-cooled hot-electron bolometers, IEEE APPL S, 9(2), 1999, pp. 4237-4240
Authors:
Wilson, CI
Ellis, CR
Salinas, LS
Lichtenberger, AW
Citation: Ci. Wilson et al., Nb oxide thin film resistors, IEEE APPL S, 9(2), 1999, pp. 1724-1726
Risultati:
1-8
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