Authors: Lime, F Clerc, R Ghibaudo, G Pananakakis, G Guegan, G

Citation: F. Lime et al., Impact of gate tunneling leakage on the operation of NMOS transistors withultra-thin gate oxides, MICROEL ENG, 59(1-4), 2001, pp. 119-125

Authors: Lime, F Ghibaudo, G Guegan, G

Citation: F. Lime et al., Stress induced leakage current at low field in ultra thin oxides, MICROEL REL, 41(9-10), 2001, pp. 1421-1425