Authors: Farhoud, M Ferrera, J Lochtefeld, AJ Murphy, TE Schattenburg, ML Carter, J Ross, CA Smith, HI

Citation: M. Farhoud et al., Fabrication of 200 nm period nanomagnet arrays using interference lithography and a negative resist, J VAC SCI B, 17(6), 1999, pp. 3182-3185