Authors:
Volland, B
Shi, F
Heerlein, H
Rangelow, IW
Hudek, P
Kostic, I
Cekan, E
Vonach, H
Loeschner, H
Horner, C
Stengl, G
Buschbeck, H
Zeininger, M
Bleeker, A
Benschop, J
Citation: B. Volland et al., Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment, J VAC SCI B, 18(6), 2000, pp. 3202-3206
Authors:
Szmanda, CR
Brainard, RL
Mackevich, JF
Awaji, A
Tanaka, T
Yamada, Y
Bohland, J
Tedesco, S
Dal'Zotto, B
Bruenger, W
Torkler, M
Fallmann, W
Loeschner, H
Kaesmaier, R
Nealey, PM
Pawloski, AR
Citation: Cr. Szmanda et al., Measuring acid generation efficiency in chemically amplified resists with all three beams, J VAC SCI B, 17(6), 1999, pp. 3356-3361
Authors:
Bruenger, WH
Torkler, M
Leung, KN
Lee, Y
Williams, MD
Loeschner, H
Stengl, G
Fallmann, W
Paschke, F
Stangl, G
Rangelow, IW
Hudek, P
Citation: Wh. Bruenger et al., Resolution improvement of ion projector with a low energy spread multicuspion source, MICROEL ENG, 46(1-4), 1999, pp. 477-480