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Results: 3

Authors: Volland, B Shi, F Heerlein, H Rangelow, IW Hudek, P Kostic, I Cekan, E Vonach, H Loeschner, H Horner, C Stengl, G Buschbeck, H Zeininger, M Bleeker, A Benschop, J
Citation: B. Volland et al., Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment, J VAC SCI B, 18(6), 2000, pp. 3202-3206

Authors: Szmanda, CR Brainard, RL Mackevich, JF Awaji, A Tanaka, T Yamada, Y Bohland, J Tedesco, S Dal'Zotto, B Bruenger, W Torkler, M Fallmann, W Loeschner, H Kaesmaier, R Nealey, PM Pawloski, AR
Citation: Cr. Szmanda et al., Measuring acid generation efficiency in chemically amplified resists with all three beams, J VAC SCI B, 17(6), 1999, pp. 3356-3361

Authors: Bruenger, WH Torkler, M Leung, KN Lee, Y Williams, MD Loeschner, H Stengl, G Fallmann, W Paschke, F Stangl, G Rangelow, IW Hudek, P
Citation: Wh. Bruenger et al., Resolution improvement of ion projector with a low energy spread multicuspion source, MICROEL ENG, 46(1-4), 1999, pp. 477-480
Risultati: 1-3 |