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Results:
1-14
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Results: 14
Authors:
Polgar, O
Fried, M
Lohner, T
Barsony, I
Citation: O. Polgar et al., A combined topographical search strategy with ellipsometric application, J GLOB OPT, 19(4), 2001, pp. 383-401
Authors:
Serenyi, M
Racz, M
Lohner, T
Citation: M. Serenyi et al., Refractive index of sputtered silicon oxynitride layers for antireflectioncoating, VACUUM, 61(2-4), 2001, pp. 245-249
Authors:
Pervan, P
Stori, H
Jenko, M
Lohner, T
Citation: P. Pervan et al., Special issue - Proceedings of the 8th Joint Vacuum Conference of Croatia,Austria, Slovenia and Hungary (JVC-8) - 4-9 June 2000, Pula, Croatia, VACUUM, 61(2-4), 2001, pp. IX-IX
Authors:
Vazsonyi, E
Szilagyi, E
Petrik, P
Horvath, ZE
Lohner, T
Fried, M
Jalsovszky, G
Citation: E. Vazsonyi et al., Porous silicon formation by stain etching, THIN SOL FI, 388(1-2), 2001, pp. 295-302
Authors:
Petrik, P
Lehnert, W
Schneider, C
Lohner, T
Fried, M
Gyulai, J
Ryssel, H
Citation: P. Petrik et al., In situ measurement of the crystallization of amorphous silicon in a vertical furnace using spectroscopic ellipsometry, THIN SOL FI, 383(1-2), 2001, pp. 235-240
Authors:
Lohner, T
Fried, M
Petrik, P
Polgar, O
Gyulai, J
Lehnert, W
Citation: T. Lohner et al., Ellipsometric characterization of oxidized porous silicon layer structures, MAT SCI E B, 69, 2000, pp. 182-187
Authors:
Khanh, NQ
Zolnai, Z
Lohner, T
Toth, L
Dobos, L
Gyulai, J
Citation: Nq. Khanh et al., He ion beam density effect on damage induced in SiC during Rutherford backscattering measurement, NUCL INST B, 161, 2000, pp. 424-428
Authors:
Petrik, P
Lehnert, W
Schneider, C
Fried, M
Lohner, T
Gyulai, J
Ryssel, H
Citation: P. Petrik et al., In situ spectroscopic ellipsometry for the characterization of polysiliconformation inside a vertical furnace, THIN SOL FI, 364(1-2), 2000, pp. 150-155
Authors:
Polgar, O
Fried, M
Lohner, T
Barsony, I
Citation: O. Polgar et al., Comparison of algorithms used for evaluation of ellipsometric measurements- Random search, genetic algorithms, simulated annealing and hill climbinggraph-searches, SURF SCI, 457(1-2), 2000, pp. 157-177
Authors:
Petrik, P
Lohner, T
Fried, M
Biro, LP
Khanh, NQ
Gyulai, J
Lehnert, W
Schneider, C
Ryssel, H
Citation: P. Petrik et al., Ellipsometric study of polycrystalline silicon films prepared by low-pressure chemical vapor deposition, J APPL PHYS, 87(4), 2000, pp. 1734-1742
Authors:
Horvath, ZE
Peto, G
Paszti, Z
Zsoldos, E
Szilagyi, E
Battistig, G
Lohner, T
Molnar, GL
Gyulai, J
Citation: Ze. Horvath et al., Enhancement of oxidation resistance in Cu and Cu(Al) thin layers, NUCL INST B, 148(1-4), 1999, pp. 868-871
Authors:
Petrik, P
Lohner, T
Fried, M
Khanh, NQ
Polgar, O
Gyulai, J
Citation: P. Petrik et al., Comparative study of ion implantation caused damage depth profiles in polycrystalline and single crystalline silicon studied by spectroscopic ellipsometry and Rutherford backscattering spectrometry, NUCL INST B, 147(1-4), 1999, pp. 84-89
Authors:
Lohner, T
Fried, M
Khanh, NQ
Petrik, P
Wormeester, H
El-Sherbiny, MA
Citation: T. Lohner et al., Comparative study of ion implantation caused anomalous surface damage in silicon studied by spectroscopic ellipsometry and Rutherford backscattering spectrometry, NUCL INST B, 147(1-4), 1999, pp. 90-95
Authors:
Fried, M
Polgar, O
Lohner, T
Strehlke, S
Levy-Clement, C
Citation: M. Fried et al., Comparative study of the oxidation of thin porous silicon layers studied by reflectometry, spectroscopic ellipsometry and secondary ion mass spectroscopy, J LUMINESC, 80(1-4), 1998, pp. 147-152
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