Authors:
Lungu, CP
Lungu, AM
Akazawa, M
Sakai, Y
Sugawara, H
Tabata, M
Citation: Cp. Lungu et al., Fluorinated carbon films with low dielectric constant made from novel fluorocarbon source materials by RF plasma enhanced chemical vapor deposition, JPN J A P 2, 38(12B), 1999, pp. L1544-L1546