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Results:
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Results: 2
Shallow-trench isolation with raised-field-oxide structure
Authors:
Chen, CM Chang, CY Chou, JW Lur, W Sun, SW
Citation:
Cm. Chen et al., Shallow-trench isolation with raised-field-oxide structure, JPN J A P 1, 39(3A), 2000, pp. 1080-1084
Effects of a new combination of additives in electroplating solution on the properties of Cu films in ULSI applications
Authors:
Hu, JC Chang, TC Wu, CW Chen, LJ Hsiung, CS Hsieh, WY Lur, W Yew, TR
Citation:
Jc. Hu et al., Effects of a new combination of additives in electroplating solution on the properties of Cu films in ULSI applications, J VAC SCI A, 18(4), 2000, pp. 1207-1210
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