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Authors: MANSANO RD VERDONCK P MACIEL HS

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Authors: MANSANO RD VERDONCK P MACIEL HS

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Authors: DEALMEIDA FR YAMAMOTO RK MACIEL HS

Citation: Fr. Dealmeida et al., REACTIVE ION ETCHING OF PECVD SILICON-NITRIDE IN SF6 PLASMA, Journal of nuclear materials, 200(3), 1993, pp. 371-374