AAAAAA
Results:
1-8
|
Results: 8
Authors:
MISRA A
MAGEL LK
Citation: A. Misra et Lk. Magel, X-RAY PHOTOELECTRON-SPECTROSCOPY OF ALUMINUM-ALLOYS EXPOSED TO CF3I PLASMA, Materials letters, 35(3-4), 1998, pp. 221-226
Authors:
LU JP
HSU WY
HONG QZ
DIXIT GA
LUTTMER JD
HAVEMANN RH
CHEN PJ
TSAI HL
MAGEL LK
Citation: Jp. Lu et al., THERMAL-STABILITY OF AL BARRIER/TISIX MULTILAYER STRUCTURES/, Thin solid films, 320(1), 1998, pp. 20-25
Authors:
LU JP
HSU WY
LUTTMER JD
MAGEL LK
TSAI HL
Citation: Jp. Lu et al., A NEW PROCESS FOR DEPOSITING TUNGSTEN NITRIDE THIN-FILMS, Journal of the Electrochemical Society, 145(2), 1998, pp. 21-23
Authors:
HSU WY
HONG QZ
LIU HY
DOUGLAS M
TAYLOR K
MAGEL LK
LUTTMER JD
HAVEMANN RH
Citation: Wy. Hsu et al., EFFECT OF AR SPUTTER ETCH ON THE TEXTURE OF TI AND AL TIN/TI METAL STACK/, Journal of the Electrochemical Society, 144(9), 1997, pp. 248-250
Authors:
LU JP
HSU WY
HONG QZ
DIXIT GA
LUTTMER JD
HAVEMANN RH
MAGEL LK
Citation: Jp. Lu et al., A NOVEL PROCESS FOR FABRICATING CONFORMAL AND STABLE TIN-BASED BARRIER, Journal of the Electrochemical Society, 143(12), 1996, pp. 279-280
Authors:
KIM TS
FILES LA
MAGEL LK
Citation: Ts. Kim et al., EFFECT OF THE OXIDE-DESORPTION TEMPERATURE ON THE SUBSTRATE-EPILAYER INTERFACE CHARGE IN ORGANOMETALLIC VAPOR-PHASE EPITAXY OF GAAS, Applied physics letters, 68(15), 1996, pp. 2126-2128
Authors:
CHANDRA D
GOODWIN MW
CHEN MC
MAGEL LK
Citation: D. Chandra et al., VARIATION OF ARSENIC DIFFUSION-COEFFICIENTS IN HGCDTE ALLOYS WITH TEMPERATURE AND HG PRESSURE - TUNING OF P-ON-N DOUBLE-LAYER HETEROJUNCTION DIODE PROPERTIES, Journal of electronic materials, 24(5), 1995, pp. 599-608
Authors:
CHO CC
LIU HY
MAGEL LK
ANTHONY JM
Citation: Cc. Cho et al., EFFECTS OF A PREDEPOSITED BORON LAYER DURING THE EPITAXIAL-GROWTH OF GE ON CAF2, Applied physics letters, 63(24), 1993, pp. 3291-3293
Risultati:
1-8
|