Authors:
MALINA V
VOGEL K
RESSEL P
BARNARD WO
KNAUER A
Citation: V. Malina et al., COMPARISON OF TI PT/AU AND TI/RU/AU CONTACT SYSTEMS TO P-TYPE INGAP/, Semiconductor science and technology, 12(10), 1997, pp. 1298-1303
Citation: V. Malina et al., AU-BE RU/AU MULTILAYER METALLIZATION AS A STABLE OHMIC CONTACT SCHEMETO P-TYPE INP/, Semiconductor science and technology, 11(7), 1996, pp. 1121-1126
Citation: V. Malina et al., EFFECT OF DEPOSITION PARAMETERS ON THE ELECTRICAL AND METALLURGICAL PROPERTIES OF AU-ZN CONTACTS TO P-TYPE INP, Semiconductor science and technology, 9(8), 1994, pp. 1523-1528
Citation: V. Malina et al., TECHNOLOGICAL ASPECTS OF THE PREPARATION OF AU-ZN OHMIC CONTACTS TO P-TYPE INP, Semiconductor science and technology, 9(1), 1994, pp. 49-53