AAAAAA

   
Results: 1-7 |
Results: 7
SCANNING CAPACITANCE MICROSCOPY MEASUREMENT OF 2-DIMENSIONAL DOPANT PROFILES ACROSS JUNCTIONS
Authors: KOPANSKI JJ MARCHIANDO JF BERNING DW ALVIS R SMITH HE
Citation: Jj. Kopanski et al., SCANNING CAPACITANCE MICROSCOPY MEASUREMENT OF 2-DIMENSIONAL DOPANT PROFILES ACROSS JUNCTIONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(1), 1998, pp. 339-343
MODEL DATABASE FOR DETERMINING DOPANT PROFILES FROM SCANNING CAPACITANCE MICROSCOPE MEASUREMENTS
Authors: MARCHIANDO JF KOPANSKI JJ LOWNEY JR
Citation: Jf. Marchiando et al., MODEL DATABASE FOR DETERMINING DOPANT PROFILES FROM SCANNING CAPACITANCE MICROSCOPE MEASUREMENTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(1), 1998, pp. 463-470
SCANNING CAPACITANCE MICROSCOPY APPLIED TO 2-DIMENSIONAL DOPANT PROFILING OF SEMICONDUCTORS
Authors: KOPANSKI JJ MARCHIANDO JF LOWNEY JR
Citation: Jj. Kopanski et al., SCANNING CAPACITANCE MICROSCOPY APPLIED TO 2-DIMENSIONAL DOPANT PROFILING OF SEMICONDUCTORS, Materials science & engineering. B, Solid-state materials for advanced technology, 44(1-3), 1997, pp. 46-51
SCANNING CAPACITANCE MICROSCOPY MEASUREMENTS AND MODELING - PROGRESS TOWARDS DOPANT PROFILING OF SILICON
Authors: KOPANSKI JJ MARCHIANDO JF LOWNEY JR
Citation: Jj. Kopanski et al., SCANNING CAPACITANCE MICROSCOPY MEASUREMENTS AND MODELING - PROGRESS TOWARDS DOPANT PROFILING OF SILICON, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(1), 1996, pp. 242-247
ON CALCULATING THE REFLECTANCE AND TRANSMITTANCE OF LIGHT FOR A SIMPLE THICK GRATING STRUCTURE
Authors: MARCHIANDO JF
Citation: Jf. Marchiando, ON CALCULATING THE REFLECTANCE AND TRANSMITTANCE OF LIGHT FOR A SIMPLE THICK GRATING STRUCTURE, J. mod. opt., 43(12), 1996, pp. 2493-2501
APPLICATION OF THE COLLOCATION METHOD IN 3 DIMENSIONS TO A MODEL SEMICONDUCTOR PROBLEM
Authors: MARCHIANDO JF
Citation: Jf. Marchiando, APPLICATION OF THE COLLOCATION METHOD IN 3 DIMENSIONS TO A MODEL SEMICONDUCTOR PROBLEM, International journal for numerical methods in engineering, 39(6), 1996, pp. 1029-1040
ON USING COLLOCATION IN 3 DIMENSIONS AND SOLVING A MODEL SEMICONDUCTOR PROBLEM
Authors: MARCHIANDO JF
Citation: Jf. Marchiando, ON USING COLLOCATION IN 3 DIMENSIONS AND SOLVING A MODEL SEMICONDUCTOR PROBLEM, Journal of research of the National Institute of Standards and Technology, 100(6), 1995, pp. 661-676
Risultati: 1-7 |