SCANNING CAPACITANCE MICROSCOPY MEASUREMENT OF 2-DIMENSIONAL DOPANT PROFILES ACROSS JUNCTIONS

Cross-sectioned p(+)/p and p-n junction test structures were imaged wi th a scanning capacitance microscope (SCM). To maintain a constant dif ference capacitance, our SCM utilizes an electronic attenuator circuit with a dynamic range of 20 V to less than 1 mV. Dopant profiles are e xtracted from SCM images using a formalism, which rapidly determines t he theoretical SCM response from a database of calculated C-V curves. A dopant profile from a p(+)/p junction determined via constant differ ence capacitance SCM is compared to a secondary ion mass spectroscopy profile from similar structures.