AAAAAA

   
Results: 1-16 |
Results: 16
FABRICATION OF PHASE MASKS WITH SUBHALF MICRON RESOLUTION BY ELECTRON-BEAM LITHOGRAPHY
Authors: DIFABRIZIO E GRELLA L GENTILI M BACIOCCHI M MASTROGIACOMO L VANINETTI F FONTANA F
Citation: E. Difabrizio et al., FABRICATION OF PHASE MASKS WITH SUBHALF MICRON RESOLUTION BY ELECTRON-BEAM LITHOGRAPHY, Microelectronic engineering, 42, 1998, pp. 121-124
MICROPHOTONIC DEVICES FABRICATED BY SILICON MICROMACHINING TECHNIQUES
Authors: DIFABRIZIO E BACIOCCHI M GENTILI M GRELLA L MASTROGIACOMO L
Citation: E. Difabrizio et al., MICROPHOTONIC DEVICES FABRICATED BY SILICON MICROMACHINING TECHNIQUES, JPN J A P 1, 36(12B), 1997, pp. 7757-7762
FABRICATION OF 5 NM RESOLUTION ELECTRODES FOR MOLECULAR DEVICES BY MEANS OF ELECTRON-BEAM LITHOGRAPHY
Authors: DIFABRIZIO E GRELLA L GENTILI M BACIOCCHI M MASTROGIACOMO L MORALES P
Citation: E. Difabrizio et al., FABRICATION OF 5 NM RESOLUTION ELECTRODES FOR MOLECULAR DEVICES BY MEANS OF ELECTRON-BEAM LITHOGRAPHY, JPN J A P 2, 36(1AB), 1997, pp. 70-72
NANOLITHOGRAPHY PERFORMANCES OF ULTRAVIOLET-III CHEMICALLY AMPLIFIED POSITIVE RESIST
Authors: GRELLA L GENTILI M DIFABRIZIO E BACIOCCHI M MASTROGIACOMO L MAGGIORA R SCOPA L
Citation: L. Grella et al., NANOLITHOGRAPHY PERFORMANCES OF ULTRAVIOLET-III CHEMICALLY AMPLIFIED POSITIVE RESIST, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2596-2600
A NOVEL X-RAY MASK CONCEPT FOR MIX-AND-MATCH LITHOGRAPHY FABRICATION OF MOS DEVICES BY SYNCHROTRON-RADIATION LITHOGRAPHY
Authors: DIFABRIZIO E GRELLA L GENTILI M BACIOCCHI M MASTROGIACOMO L CHOI SS JEON YJ YOO HJ CHUNG HB
Citation: E. Difabrizio et al., A NOVEL X-RAY MASK CONCEPT FOR MIX-AND-MATCH LITHOGRAPHY FABRICATION OF MOS DEVICES BY SYNCHROTRON-RADIATION LITHOGRAPHY, Microelectronic engineering, 35(1-4), 1997, pp. 553-556
ONE-STEP ELECTRON-BEAM LITHOGRAPHY FOR MULTIPURPOSE, DIFFRACTIVE OPTICAL-ELEMENTS WITH 200 NM RESOLUTION
Authors: DIFABRIZIO E GRELLA L BACIOCCHI M GENTILI M PESCHIAROLI D MASTROGIACOMO L MAGGIORA R
Citation: E. Difabrizio et al., ONE-STEP ELECTRON-BEAM LITHOGRAPHY FOR MULTIPURPOSE, DIFFRACTIVE OPTICAL-ELEMENTS WITH 200 NM RESOLUTION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3855-3859
EXPOSURE LATITUDE AND CD CONTROL STUDY FOR ADDITIVELY PATTERNED X-RAYMASK WITH GBIT DRAM COMPLEXITY
Authors: BACIOCCHI M DIFABRIZIO E GENTILI M GRELLA L MAGGIORA L MASTROGIACOMO L PESCHIAROLI D CHOI S JEON YJ CHUNG HB YOO HJ
Citation: M. Baciocchi et al., EXPOSURE LATITUDE AND CD CONTROL STUDY FOR ADDITIVELY PATTERNED X-RAYMASK WITH GBIT DRAM COMPLEXITY, Microelectronic engineering, 30(1-4), 1996, pp. 195-198
NANOFABRICATION OF FRESNEL ZONE PLATES FOR X-RAY FOCUSING
Authors: BACIOCCHI M DIFABRIZIO E GENTILI M GRELLA L MAGGIORA R MASTROGIACOMO L PESCHIAROLI D
Citation: M. Baciocchi et al., NANOFABRICATION OF FRESNEL ZONE PLATES FOR X-RAY FOCUSING, JPN J A P 1, 34(12B), 1995, pp. 6758-6763
HIGH-ACCURACY THICKNESS MEASUREMENTS BY MEANS OF BACKSCATTERING ELECTRON METROLOGY
Authors: BACIOCCHI M DIFABRIZIO E GENTILI M GRELLA L MAGGIORA R MASTROGIACOMO L PESCHIAROLI D
Citation: M. Baciocchi et al., HIGH-ACCURACY THICKNESS MEASUREMENTS BY MEANS OF BACKSCATTERING ELECTRON METROLOGY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2676-2681
NANOMETER METROLOGY BY MEANS OF BACKSCATTERED ELECTRONS
Authors: DIFABRIZIO E GRELLA L GENTILI M BACIOCCHI M MASTROGIACOMO L MAGGIORA R
Citation: E. Difabrizio et al., NANOMETER METROLOGY BY MEANS OF BACKSCATTERED ELECTRONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(2), 1995, pp. 321-326
DEVELOPMENT OF A FAST AND HIGH-RESOLUTION E-BEAM PROCESS FOR THE FABRICATION OF X-RAY MASKS WITH CD OF 0.15 MU-M
Authors: RAPTIS I GENTILI M DIFABRIZIO E MAGGIORA R BACIOCCHI M GRELLA L MASTROGIACOMO L
Citation: I. Raptis et al., DEVELOPMENT OF A FAST AND HIGH-RESOLUTION E-BEAM PROCESS FOR THE FABRICATION OF X-RAY MASKS WITH CD OF 0.15 MU-M, Microelectronic engineering, 27(1-4), 1995, pp. 417-420
SECONDARY-ELECTRON LINE SCANS OVER HIGH-RESOLUTION RESIST IMAGES - THEORETICAL AND EXPERIMENTAL INVESTIGATION OF INDUCED LOCAL ELECTRICAL-FIELD EFFECTS
Authors: GRELLA L DIFABRIZIO E GENTILI M BACIOCCHI M MASTROGIACOMO L MAGGIORA R CAPODICCI L
Citation: L. Grella et al., SECONDARY-ELECTRON LINE SCANS OVER HIGH-RESOLUTION RESIST IMAGES - THEORETICAL AND EXPERIMENTAL INVESTIGATION OF INDUCED LOCAL ELECTRICAL-FIELD EFFECTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3555-3560
FABRICATION OF CONTROLLED SLOPE ATTENUATED PHASE-SHIFT X-RAY MASKS FOR 250 NM SYNCHROTRON LITHOGRAPHY
Authors: GENTILI M DIFABRIZIO E GRELLA L BACIOCCHI M MASTROGIACOMO L MAGGIORA R XIAO J CERRINA F
Citation: M. Gentili et al., FABRICATION OF CONTROLLED SLOPE ATTENUATED PHASE-SHIFT X-RAY MASKS FOR 250 NM SYNCHROTRON LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3954-3958
METROLOGY OF HIGH-RESOLUTION RESIST STRUCTURES ON INSULATING SUBSTRATES
Authors: DIFABRIZIO E GRELLA L LUCIANI L GENTILI M BACIOCCHI M FIGLIOMENI M MASTROGIACOMO L MAGGIORA R LEONARD Q CERRINA F MOLINO M POWDERLY D
Citation: E. Difabrizio et al., METROLOGY OF HIGH-RESOLUTION RESIST STRUCTURES ON INSULATING SUBSTRATES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2456-2462
METROLOGY FOR REPLICATED X-RAY MASKS USING AN ELECTRON-BEAM MACHINE
Authors: LUCIANI L DIFABRIZIO E GRELLA L BACIOCCHI M FIGLIOMENI M GENTILI M MASTROGIACOMO L MAGGIORA R KRASPENOVA A REILLY M
Citation: L. Luciani et al., METROLOGY FOR REPLICATED X-RAY MASKS USING AN ELECTRON-BEAM MACHINE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2463-2467
DEVELOPMENT OF AN ELECTRON-BEAM PROCESS FOR THE FABRICATION OF X-RAY NANOMASKS
Authors: GENTILI M GRELLA L DIFABRIZIO E LUCIANI L BACIOCCHI M FIGLIOMENI M MAGGIORA R MASTROGIACOMO L CERRINA F
Citation: M. Gentili et al., DEVELOPMENT OF AN ELECTRON-BEAM PROCESS FOR THE FABRICATION OF X-RAY NANOMASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2938-2942
Risultati: 1-16 |