Authors: CONLEY JF LENAHAN PM MCARTHUR WF

Citation: Jf. Conley et al., PRELIMINARY INVESTIGATION OF THE KINETICS OF POSTOXIDATION RAPID THERMAL ANNEAL INDUCED HOLE-TRAP-PRECURSOR FORMATION IN MICROELECTRONIC SIO2-FILMS, Applied physics letters, 73(15), 1998, pp. 2188-2190