Authors: RODBELL KP KNORR DB MIS JD

Citation: Kp. Rodbell et al., THE MICROSTRUCTURE, MECHANICAL-STRESS, TEXTURE, AND ELECTROMIGRATION BEHAVIOR OF AL-PD ALLOYS, Journal of electronic materials, 22(6), 1993, pp. 597-606

Authors: MIS JD MADER SR BESHERS DN

Citation: Jd. Mis et al., EFFECTS OF A STRESS-FIELD ON BORON ION-IMPLANTATION DAMAGE IN SILICON, Journal of applied physics, 74(4), 1993, pp. 2294-2299