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X-RAY TOPOGRAPHIC CONTRAST OF ION-IMPLANT ATION BOUNDARIES IN SILICON-CRYSTALS
Authors:
POLOVINIKINA VI MITINSKAYA TV SMOLSKII IL IMAMOV RM GRABCHAK VP ALEKSANDROV PA
Citation:
Vi. Polovinikina et al., X-RAY TOPOGRAPHIC CONTRAST OF ION-IMPLANT ATION BOUNDARIES IN SILICON-CRYSTALS, Kristallografia, 41(1), 1996, pp. 136-142
Risultati:
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