Citation: F. Falk et al., CO2-LASER CVD OF A-SI-H - IN-SITU GAS-ANALYSIS AND MODEL-CALCULATIONS, Applied physics A: Materials science & processing, 67(5), 1998, pp. 507-512
Authors:
FALK F
MEINSCHIEN J
MOLLEKOPF G
SCHUSTER K
STAFAST H
Citation: F. Falk et al., CNX THIN-FILMS PREPARED BY LASER-CHEMICAL VAPOR-DEPOSITION, Materials science & engineering. B, Solid-state materials for advanced technology, 46(1-3), 1997, pp. 89-91