Authors: MELNGAILIS J MONDELLI AA BERRY IL MOHONDRO R

Citation: J. Melngailis et al., A REVIEW OF ION PROJECTION LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 927-957

Authors: BERRY IL MONDELLI AA NICHOLS J MELNGAILIS J

Citation: Il. Berry et al., PROGRAMMABLE APERTURE PLATE FOR MASKLESS HIGH-THROUGHPUT NANOLITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2382-2386

Authors: LEE Y GOUGH RA KUNKEL WB LEUNG KN PERKINS LT PICKARD DS SUN L VUJIC J WILLIAMS MD WUTTE D MONDELLI AA STENGL G

Citation: Y. Lee et al., AXIAL ENERGY SPREAD MEASUREMENTS OF AN ACCELERATED POSITIVE-ION BEAM, Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 385(2), 1997, pp. 204-208

Authors: PETILLO JJ MONDELLI AA

Citation: Jj. Petillo et Aa. Mondelli, GLOBAL AND STOCHASTIC SPACE-CHARGE EFFECTS IN ION-BEAM LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2409-2413

Authors: CHALUPKA A STENGL G BUSCHBECK H LAMMER G VONACH H FISCHER R HAMMEL E LOSCHNER H NOWAK R WOLF P FINKELSTEIN W HILL RW BERRY IL HARRIOTT LR MELNGAILIS J RANDALL JN WOLFE JC STROH H WOLLNIK H MONDELLI AA PETILLO JJ LEUNG K

Citation: A. Chalupka et al., NOVEL ELECTROSTATIC COLUMN FOR ION PROJECTION LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3513-3517