Authors:
SASSELLA A
BORGHESI A
CORNI F
MONELLI A
OTTAVIANI G
TONINI R
PIVAC B
BACCHETTA M
ZANOTTI L
Citation: A. Sassella et al., INFRARED STUDY OF SI-RICH SILICON-OXIDE FILMS DEPOSITED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(2), 1997, pp. 377-389
Authors:
TONINI R
MONELLI A
CORNI F
FRABBONI S
OTTAVIANI G
QUEIROLO G
Citation: R. Tonini et al., SILICON INTERSTITIALS GENERATION DURING THE EXPOSURE OF SILICON TO HYDROGEN PLASMA, Materials science & engineering. B, Solid-state materials for advanced technology, 36(1-3), 1996, pp. 158-161