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Citation: Pj. Paniez et al., EXTENSIVE THERMAL CHARACTERIZATION OF ADVANCED RESISTS BY MODULATED TEMPERATURE DSC (MT-DSC) - APPLICATION TO ACRYLATE BASED 193 NM RESISTS, Microelectronic engineering, 42, 1998, pp. 367-370

Authors: MORTINI B TEDESCO S DALZOTTO B PANIEZ P

Citation: B. Mortini et al., SPECIFIC BEHAVIOR OF CHEMICALLY AMPLIFIED SYSTEMS WITH LOW-ACTIVATIONENERGY UNDER ELECTRON-BEAM EXPOSURE - IMPLEMENTATION OF 248 AND 193 NM RESISTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2534-2540