Pj. Paniez et al., EXTENSIVE THERMAL CHARACTERIZATION OF ADVANCED RESISTS BY MODULATED TEMPERATURE DSC (MT-DSC) - APPLICATION TO ACRYLATE BASED 193 NM RESISTS, Microelectronic engineering, 42, 1998, pp. 367-370
The extensive thermal characterization of a typical acrylate based 193
nm resist is presented using the new MT-DSC technique. Unlike convent
ional DSC, the deconvolution of the reversing component with the nonre
versing deprotection signal allows the determination of the Tg of thes
e systems. The influence of the concentration in THP protecting group
is investigated. The results obtained point out some of the problems e
ncountered in the design of acrylate based resists such as Tg value an
d microphase separation.