Authors:
BAUD L
PASSEMARD G
GOBIL Y
MSAAD H
CORTE A
PIRES F
FUGIER P
NOEL P
RABINZOHN P
BEINGLASS I
Citation: L. Baud et al., INTEGRATION OF A STACK OF 2 FLUORINE-DOPED SILICON-OXIDE THIN-FILMS WITH INTERCONNECT METALLIZATION FOR A SUB-0.35 MU-M INTER-METAL DIELECTRIC APPLICATION, Microelectronic engineering, 37-8(1-4), 1997, pp. 261-269
Authors:
NORGA GJ
BLACK KA
MSAAD H
MICHEL J
KIMERLING LC
Citation: Gj. Norga et al., SIMULATION AND IN-SITU MONITORING OF METALLIC CONTAMINATION AND SURFACE ROUGHENING IN WET WAFER CLEANING SOLUTIONS, Materials science and technology, 11(1), 1995, pp. 90-93