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THE FORMATION OF RADIATION-INDUCED DEFECT IN SILICON, IRRADIATED BY ELECTRONS UNDER THE TEMPERATURES OF 20-K-300-K
Authors:
KORSHUNOV FP MUDRY AV PATUK AI SHAKIN IA
Citation:
Fp. Korshunov et al., THE FORMATION OF RADIATION-INDUCED DEFECT IN SILICON, IRRADIATED BY ELECTRONS UNDER THE TEMPERATURES OF 20-K-300-K, Doklady Akademii nauk BSSR, 37(5), 1993, pp. 31-34
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