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Results: 1-25/58
Authors:
MUSIL J
REGENT F
Citation: J. Musil et F. Regent, FORMATION OF NANOCRYSTALLINE NICR-N FILMS BY REACTIVE DC MAGNETRON SPUTTERING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(6), 1998, pp. 3301-3304
Authors:
VLCEK J
SPATENKA P
MUSIL J
FOREJT L
Citation: J. Vlcek et al., FUNDAMENTALS OF ELEMENTARY PROCESSES IN PLASMAS, Surface & coatings technology, 98(1-3), 1998, pp. 1557-1564
Authors:
MUSIL J
Citation: J. Musil, RECENT ADVANCES IN MAGNETRON SPUTTERING TECHNOLOGY, Surface & coatings technology, 101(1-3), 1998, pp. 280-286
Authors:
MUSIL J
VLCEK J
Citation: J. Musil et J. Vlcek, MAGNETRON SPUTTERING OF FILMS WITH CONTROLLED TEXTURE AND GRAIN-SIZE, Materials chemistry and physics, 54(1-3), 1998, pp. 116-122
Authors:
MUSIL J
Citation: J. Musil, LOW-PRESSURE MAGNETRON SPUTTERING, Vacuum, 50(3-4), 1998, pp. 363-372
Authors:
MUSIL J
JEZEK V
BENDA M
VLCEK J
Citation: J. Musil et al., PHASE-TRANSFORMATION IN SPUTTERED TI-SS ALLOY FILM DURING PLASMA NITRIDING, Thin solid films, 317(1-2), 1998, pp. 458-462
Authors:
MUSIL J
HOVORKA D
MISINA M
BELL AJ
STUDNICKA V
Citation: J. Musil et al., NANOCRYSTALLINE TITANIUM CARBIDE THIN-FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING, Czechoslovak journal of Physics, 48(8), 1998, pp. 963-971
Authors:
MUSIL J
VLCEK J
Citation: J. Musil et J. Vlcek, MAGNETRON SPUTTERING OF ALLOY-BASED FILMS AND ITS SPECIFICITY, Czechoslovak Journal of Physics, 48(10), 1998, pp. 1209-1224
Authors:
SETSUHARA Y
KAMAI M
MIYAKE S
MUSIL J
Citation: Y. Setsuhara et al., INDUCTIVELY-COUPLED-PLASMA-ASSISTED PLANAR MAGNETRON DISCHARGE FOR ENHANCED IONIZATION OF SPUTTERED ATOMS, JPN J A P 1, 36(7B), 1997, pp. 4568-4571
Authors:
SPATENKA P
LEIPNER I
VLCEK J
MUSIL J
Citation: P. Spatenka et al., A COMPARISON OF INTERNAL PLASMA PARAMETERS IN A CONVENTIONAL PLANAR MAGNETRON AND A MAGNETRON WITH ADDITIONAL PLASMA-CONFINEMENT, Plasma sources science & technology, 6(1), 1997, pp. 46-52
Authors:
BENDA M
VLCEK J
CIBULKA V
MUSIL J
Citation: M. Benda et al., PLASMA NITRIDING COMBINED WITH A HOLLOW-CATHODE DISCHARGE SPUTTERING AT HIGH-PRESSURES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(5), 1997, pp. 2636-2643
Authors:
MUSIL J
MISINA M
HOVORKA D
Citation: J. Musil et al., PLANAR MAGNETRON SPUTTERING DISCHARGE ENHANCED WITH RADIO-FREQUENCY OR MICROWAVE MAGNETOACTIVE PLASMA, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(4), 1997, pp. 1999-2006
Authors:
MUSIL J
BELL AJ
CEPERA M
ZEMAN J
Citation: J. Musil et al., THE STRUCTURE OF CU-AL FILMS PREPARED BY UNBALANCED DC MAGNETRON SPUTTERING, Surface & coatings technology, 96(2-3), 1997, pp. 359-363
Authors:
ZUREK Z
JEDLINSKI J
KOWALSKI K
KOWALSKA K
KOLARIK V
ENGEL W
MUSIL J
FIALA P
Citation: Z. Zurek et al., CORROSION OF BOND COAT NI22CR10ALY-ALLOY IN SULFUR-CONTAINING ATMOSPHERE AT TEMPERATURES OF 1173 AND 1273 K, Solid state ionics, 101, 1997, pp. 743-747
Authors:
MUSIL J
REIFOVA I
WALLERSTEIN I
CHAN J
CAPRA F
CASTORIADIS C
PETRUSKOVI M
Citation: J. Musil et al., SOCIOLOGISTS ON THE CLOSE OF MILLENIUM - INTERVIEWS FROM FORUM-2000, SOCIOL CAS, 33(4), 1997, pp. 467-478
Authors:
MUSIL J
Citation: J. Musil, THE FUTURE OF A WELFARE-STATE, A INTERNATIONAL-CONFERENCE HELD IN APRIL 1997, PRAGUE, THE CZECH-REPUBLIC, SOCIOL CAS, 33(3), 1997, pp. 359-360
Authors:
KANICKY V
MUSIL J
MERMET JM
Citation: V. Kanicky et al., DETERMINATION OF ZR AND TI IN 3-MU-M-THICK ZRTIN CERAMIC COATING USING LASER-ABLATION INDUCTIVELY-COUPLED PLASMA-ATOMIC EMISSION-SPECTROMETRY, Applied spectroscopy, 51(7), 1997, pp. 1037-1041
Authors:
KANICKY V
NOVOTNY I
MUSIL J
MERMET JM
Citation: V. Kanicky et al., DEPTH PROFILING OF THICK LAYERS OF GRADED METAL ZIRCONIA CERAMIC COATINGS USING LASER-ABLATION INDUCTIVELY-COUPLED PLASMA-ATOMIC EMISSION-SPECTROMETRY, Applied spectroscopy, 51(7), 1997, pp. 1042-1046
Authors:
MURALIDHAR GK
MUSIL J
KADLEC S
Citation: Gk. Muralidhar et al., DISCHARGE CHARACTERISTICS OF A FACING TARGET SPUTTERING DEVICE USING UNBALANCED MAGNETRONS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(4), 1996, pp. 2182-2186
Authors:
MUSIL J
RAJSKY A
BELL AJ
MATOUS J
CEPERA M
ZEMAN J
Citation: J. Musil et al., HIGH-RATE MAGNETRON SPUTTERING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(4), 1996, pp. 2187-2191
Authors:
MUSIL J
BELL AJ
VLCEK J
HURKMANS T
Citation: J. Musil et al., FORMATION OF HIGH-TEMPERATURE PHASES IN SPUTTER-DEPOSITED TI-BASED FILMS BELOW 100-DEGREES-C, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(4), 1996, pp. 2247-2250
Authors:
MUSIL J
VLCEK J
JEZEK V
BENDA M
KUBASEK M
SOUKUP L
Citation: J. Musil et al., INTERDIFFUSION BETWEEN TI AND STEEL ELEMENTS IN TI COATING STEEL SUBSTRATE COUPLE/, Vacuum, 47(6-8), 1996, pp. 871-877
Authors:
KADLEC S
MUSIL J
Citation: S. Kadlec et J. Musil, LOW-PRESSURE MAGNETRON SPUTTERING AND SELFSPUTTERING DISCHARGES, Vacuum, 47(3), 1996, pp. 307-311
Authors:
MUSIL J
Citation: J. Musil, DEPOSITION OF THIN-FILMS USING MICROWAVE PLASMAS - PRESENT STATUS ANDTRENDS, Vacuum, 47(2), 1996, pp. 145-155
Authors:
MUSIL J
BELL AJ
CEPERA M
ZEMAN J
Citation: J. Musil et al., XRD CHARACTERIZATION OF THIN-FILMS WITH LOW-INTENSITY REFLECTION LINES, Vacuum, 47(10), 1996, pp. 1145-1147