Gk. Muralidhar et al., DISCHARGE CHARACTERISTICS OF A FACING TARGET SPUTTERING DEVICE USING UNBALANCED MAGNETRONS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(4), 1996, pp. 2182-2186
Citations number
13
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
This article presents the details of our investigations on the charact
eristics of a facing target sputter discharge using two highly efficie
nt unbalanced magnetrons with electromagnetic coils. The variation of
ignition and extinction pressures has been studied as a function of th
e current in the coils (I-1 and I-2) in both the magnetrons at two int
ertarget distances 290 and 125 mm, respectively. These studies have be
en carried out in closed as well as cusp field configurations and the
results are compared. A negative resistance region has been observed i
n the discharge characteristic in the cusp field at longer intertarget
distances (290 mm), which has been explained on the basis of electron
trapping efficiency. Although the closed field has been found to be a
dvantageous in achieving the lower pressure operation possible (0.01 P
a), deposition rates are relatively higher (about 20%) in the cusp fie
ld. (C) 1996 American Vacuum Society.