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Citation: Cr. Szmanda et al., Measuring acid generation efficiency in chemically amplified resists with all three beams, J VAC SCI B, 17(6), 1999, pp. 3356-3361

Authors: Brainard, RL Henderson, C Cobb, J Rao, V Mackevich, JF Okoroanyanwu, U Gunn, S Chambers, J Connolly, S

Citation: Rl. Brainard et al., Comparison of the lithographic properties of positive resists upon exposure to deep- and extreme-ultraviolet radiation, J VAC SCI B, 17(6), 1999, pp. 3384-3389