Authors: Erramli, H Misdaq, MA Blondiaux, G Maddalon-Vinante, C Barbier, D

Citation: H. Erramli et al., Oxygen profiling in Czochralski-grown silicon substrates submitted to a rapid thermal annealing by using charged particles activation analysis, NUCL INST B, 145(4), 1998, pp. 562-566