AAAAAA
Results:
1-8
|
Results: 8
Authors:
Malkomes, N
Szyszka, B
Citation: N. Malkomes et B. Szyszka, Nonclassical impedance control of the high rate midfrequency reactive magnetron sputter process using harmonic analysis, J VAC SCI A, 19(5), 2001, pp. 2368-2372
Authors:
Malkomes, N
Vergohl, M
Szyszka, B
Citation: N. Malkomes et al., Properties of aluminum-doped zinc oxide films deposited by high rate mid-frequency reactive magnetron sputtering, J VAC SCI A, 19(2), 2001, pp. 414-419
Authors:
Vergohl, M
Malkomes, N
Matthee, T
Brauer, G
Richter, U
Nickol, FW
Bruch, J
Citation: M. Vergohl et al., In situ monitoring of optical coatings on architectural glass and comparison of the accuracy of the layer thickness attainable with ellipsometry and photometry, THIN SOL FI, 392(2), 2001, pp. 258-264
Authors:
Malkomes, N
Vergohl, M
Citation: N. Malkomes et M. Vergohl, Dynamic simulation of process control of the reactive sputter process and experimental results, J APPL PHYS, 89(1), 2001, pp. 732-739
Authors:
Vergohl, M
Malkomes, N
Szyszka, B
Neumann, F
Matthee, T
Brauer, G
Citation: M. Vergohl et al., Optimization of the reflectivity of magnetron sputter deposited silver films, J VAC SCI A, 18(4), 2000, pp. 1632-1637
Authors:
Vergohl, M
Hunsche, B
Malkomes, N
Matthee, T
Szyszka, B
Citation: M. Vergohl et al., Stabilization of high-deposition-rate reactive magnetron sputtering of oxides by in situ spectroscopic ellipsometry and plasma diagnostics, J VAC SCI A, 18(4), 2000, pp. 1709-1712
Authors:
Vergohl, M
Malkomes, N
Matthee, T
Brauer, G
Citation: M. Vergohl et al., Real time control of reactive magnetron-sputter deposited optical filters by in situ spectroscopic ellipsometry, THIN SOL FI, 377, 2000, pp. 43-47
Authors:
Vergohl, M
Malkomes, N
Staedler, T
Matthee, T
Richter, U
Citation: M. Vergohl et al., Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO2and SiO2 films for process control, THIN SOL FI, 351(1-2), 1999, pp. 42-47
Risultati:
1-8
|