Authors: Grun, J Fischer, RP Peckerar, M Felix, CL Covington, BC DeSisto, WJ Donnelly, DW Ting, A Manka, CK

Citation: J. Grun et al., Athermal annealing of phosphorus-ion-implanted silicon, APPL PHYS L, 77(13), 2000, pp. 1997-1999