Authors: Nordquist, K Resnick, DJ Ivin, V Mangat, P Lu, B Masnyj, Z Ainley, E Dauksher, WJ Mancini, D Silakov, M Minyushkin, D Vorotnikova, N

Citation: K. Nordquist et al., Large area electron scattering effects on SCALPEL mask critical dimension control, MICROEL ENG, 57-8, 2001, pp. 505-510

Authors: Nordquist, K Ainley, E Resnick, DJ Weisbrod, E Martin, C Engelstad, R Masnyj, Z Mangat, P

Citation: K. Nordquist et al., Inter and intramembrane resist critical dimension uniformity across a SCALPEL mask, J VAC SCI B, 18(6), 2000, pp. 3242-3247